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ADC will develop a state-of-the-art high-resolution extreme-ultraviolet-light (EUV) microscope
05/03/2012 - 11/30/-0001

ADC USA, Inc. announced today that it received a contract from Lawrence Berkeley National Laboratory to design and build a state-of-the-art high-resolution extreme-ultravioletlight (EUV) microscope system.

 

The microscope will be designed to image the reflective surface of EUV photomasks that are critical components in photolithography—the process used to mass-produce semiconductor electronic devices. Major components of the system include: a large vacuum chamber to
house the experimental area; active vibration control system; 3 axis in-vacuum motion stages; and an automated load-lock for inserting the EUV photomasks.

 

In making the announcement, ADC President and CEO, Alexander Deyhim, stated, "This
contract demonstrates ADC’s commitment to quality and its ability to deliver complex turn-key systems to customers that demand the best in the industry”.

 

The Lawrence Berkeley National Laboratory, is a U.S. Department of Energy (DOE) national laboratory conducting unclassified scientific research. It is located on the grounds of the University of California, Berkeley, in the Berkeley Hills above the central campus. It is managed and operated by the University of California for the DOE.

 

About the company: Founded in 1995, ADC USA, Inc. custom designs devices, integrated systems and a broad array of high-precision components and instruments for commercial, academic and government agencies worldwide. The company’s work covers mechanical design, control instrumentation, control software, manufacturing and assembly, and installation and training. For additional information, visit the ADC web site at www.adc9001.com.

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